[ E-E PROM ] |
Electrically-Erasable PROM
Àü±âÀûÀ¸·Î ¼Ò°Å¿Í ¾²±â°¡ °¡´ÉÇϸç Àü¿ø Àü¾ÐÀÌOFF µÇ¾îµµ Data°¡ º¸Á¸µÈ´Ù. Parallel·Î Data¸¦ ÁÖ°í ¹Þ´Â Intel Type°ú Serial·Î Data¸¦ ÁÖ°í ¹Þ´Â NEC TypeÀ¸·Î ³ª´¶´Ù. TunnelingÀ» ÀÌ¿ëÇÏ¿© Àü±âÀûÀ¸·Î Erase¿Í ProgrammingÀÌ °¡´ÉÇϱ⠶§¹®¿¡ »ç¿ëÀÚ°¡ In-System ¿¡¼ Á¤º¸ º¯°æÀÌ °¡´ÉÇÏ´Ù. ±×·¯³ª 2°³ÀÇ Transistor·Î¼ 1cellÀ» ±¸¼ºÇØ¾ß Çϱ⠶§¹®¿¡ EPROM¿¡ ºñÇÏ¿© ¸éÀûÀÌ Å©°í °í°¡ÀÌ´Ù
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[ E-Test ] |
Electrical Test
ProcessµÈ Wafer¸¦ passivationÀü Test patternÀ» »ç¿ëÇÏ¿© TestÇϴ ù ¹øÂ°ÀÇ Àü±âÀû Test(i.e. Wafer mapping) |
[ E/D MOS ] |
Enhancement-Depletion MOS
EnhancementÇü MOS¿¡ DepletionÇü MOS¸¦ ºÎÇÏ·Î ÇÑ ±âº» ¼¿À» °®´Â ȸ·Î |
[ E/Post Simulation ] |
SimulationÀÇ ½ÃÇàÀýÂ÷»ó¿¡¼ layoutÀü¿¡ estimated wire capacitance¸¦ »ç¿ëÇØ¼ ½Ç½ÃÇÏ´Â °ÍÀ» Pre SimulationÀ̶ó Çϰí,layoutÈÄ¿¡ actual wire capacitance¸¦ »ç¿ëÇØ¼ ½Ç½ÃÇÏ´Â °ÍÀ» Post SimulationÀ̶ó ÇÑ´Ù |
[ EA ] |
Exhaust Air
°øÁ¤Áß Àåºñ¿¡¼ ¹ß»ýÇÏ´Â GAS¸¦ ¹èÃâ½ÃŰ´Â ¹è±â°¡½º·Î ±× Á¾·ù´Â »ê,ÀϹÝ,À¯±â,ºñ¼Ò,°¡¿,¿ ¹× ±ä±Þ¹è±â µîÀÌ ÀÖ´Ù |
[ EAROM ] |
Electrically Alterable ROM
EPROMÀÇ ÀÏÁ¾À¸·Î Àü±âÀûÀÎ ÀÚ±ØÀ¸·Î Á¤º¸ÀÇ ³»¿ëÀ» ¹Ù²Ü ¼ö ÀÖ´Â ÀåÄ¡ |
[ EBE ] |
Electron-Beam Evaporation
ÀüÀÚ BeamÀ¸·Î ÁõÂø ½Ã۰íÀÚ ÇÏ´Â ±Ý¼Ó µ¢¾î¸®¸¦ ³ì¿© ±Ý¼ÓÀÔÀÚ¸¦ Wafer(±âÆÇ)»ó¿¡ ÀÔÈ÷´Â ¹æ¹ý
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[ EBGA ] |
Electronic Ball Grid Array
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[ EBR ] |
Edge Bead Removal
Wafer °¡ÀåÀÚ¸®ÀÇ °¨±¤¸·À» Á¦°Å½ÃÄÑ particle ¹ß»ýÇö»óÀ» Á¦°Å½ÃÄÑÁÖ´Â °øÁ¤
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[ ECC ] |
Error Check & Correction
ROM deviceÀÇ repair¿¡¼ ¸ðµç column°ú row´Â °¢°¢ ´Ù¸£°Ô programµÇ¾î ÀÖ¾î, RAM¿¡¼¿Í °°Àº Redency¸¦ »ç¿ëÇÒ ¼ö ¾ø´Ù. µû¶ó¼ logicÀ» »ç¿ëÇÏ¿© ÇÁ·Î±×·¥µÈ columnÀ̳ª row¸¦ Á¦ÀÛÇÏ¿© failµÈ columnÀ̳ª row¸¦ ´ëüÇÏ´Â ±â¼ú. ½Ã½ºÅÛ µ¿À۽à ¹ß»ýµÇ´Â ¿À·ù¸¦ ÀÚµ¿À¸·Î üũ ¹× ¼öÁ¤ÇÒ ¼ö ÀÖ´Â ±â´ÉÀ» ¸»Çϸç,MASK ROM ¹× DRAM Module Á¦À۽à »ç¿ëµÊ
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