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[ E-E PROM ]
  Electrically-Erasable PROM Àü±âÀûÀ¸·Î ¼Ò°Å¿Í ¾²±â°¡ °¡´ÉÇϸç Àü¿ø Àü¾ÐÀÌOFF µÇ¾îµµ Data°¡ º¸Á¸µÈ´Ù. Parallel·Î Data¸¦ ÁÖ°í ¹Þ´Â Intel Type°ú Serial·Î Data¸¦ ÁÖ°í ¹Þ´Â NEC TypeÀ¸·Î ³ª´¶´Ù. TunnelingÀ» ÀÌ¿ëÇÏ¿© Àü±âÀûÀ¸·Î Erase¿Í ProgrammingÀÌ °¡´ÉÇϱ⠶§¹®¿¡ »ç¿ëÀÚ°¡ In-System ¿¡¼­ Á¤º¸ º¯°æÀÌ °¡´ÉÇÏ´Ù. ±×·¯³ª 2°³ÀÇ Transistor·Î¼­ 1cellÀ» ±¸¼ºÇØ¾ß Çϱ⠶§¹®¿¡ EPROM¿¡ ºñÇÏ¿© ¸éÀûÀÌ Å©°í °í°¡ÀÌ´Ù
[ E-Test ]
  Electrical Test ProcessµÈ Wafer¸¦ passivationÀü Test patternÀ» »ç¿ëÇÏ¿© TestÇϴ ù ¹øÂ°ÀÇ Àü±âÀû Test(i.e. Wafer mapping)
[ E/D MOS ]
  Enhancement-Depletion MOS EnhancementÇü MOS¿¡ DepletionÇü MOS¸¦ ºÎÇÏ·Î ÇÑ ±âº» ¼¿À» °®´Â ȸ·Î
[ E/Post Simulation ]
  SimulationÀÇ ½ÃÇàÀýÂ÷»ó¿¡¼­ layoutÀü¿¡ estimated wire capacitance¸¦ »ç¿ëÇØ¼­ ½Ç½ÃÇÏ´Â °ÍÀ» Pre SimulationÀ̶ó Çϰí,layoutÈÄ¿¡ actual wire capacitance¸¦ »ç¿ëÇØ¼­ ½Ç½ÃÇÏ´Â °ÍÀ» Post SimulationÀ̶ó ÇÑ´Ù
[ EA ]
  Exhaust Air °øÁ¤Áß Àåºñ¿¡¼­ ¹ß»ýÇÏ´Â GAS¸¦ ¹èÃâ½ÃŰ´Â ¹è±â°¡½º·Î ±× Á¾·ù´Â »ê,ÀϹÝ,À¯±â,ºñ¼Ò,°¡¿­,¿­ ¹× ±ä±Þ¹è±â µîÀÌ ÀÖ´Ù
[ EAROM ]
  Electrically Alterable ROM EPROMÀÇ ÀÏÁ¾À¸·Î Àü±âÀûÀÎ ÀÚ±ØÀ¸·Î Á¤º¸ÀÇ ³»¿ëÀ» ¹Ù²Ü ¼ö ÀÖ´Â ÀåÄ¡
[ EBE ]
  Electron-Beam Evaporation ÀüÀÚ BeamÀ¸·Î ÁõÂø ½Ã۰íÀÚ ÇÏ´Â ±Ý¼Ó µ¢¾î¸®¸¦ ³ì¿© ±Ý¼ÓÀÔÀÚ¸¦ Wafer(±âÆÇ)»ó¿¡ ÀÔÈ÷´Â ¹æ¹ý
[ EBGA ]
  Electronic Ball Grid Array
[ EBR ]
  Edge Bead Removal Wafer °¡ÀåÀÚ¸®ÀÇ °¨±¤¸·À» Á¦°Å½ÃÄÑ particle ¹ß»ýÇö»óÀ» Á¦°Å½ÃÄÑÁÖ´Â °øÁ¤
[ ECC ]
  Error Check & Correction ROM deviceÀÇ repair¿¡¼­ ¸ðµç column°ú row´Â °¢°¢ ´Ù¸£°Ô programµÇ¾î ÀÖ¾î, RAM¿¡¼­¿Í °°Àº Redency¸¦ »ç¿ëÇÒ ¼ö ¾ø´Ù. µû¶ó¼­ logicÀ» »ç¿ëÇÏ¿© ÇÁ·Î±×·¥µÈ columnÀ̳ª row¸¦ Á¦ÀÛÇÏ¿© failµÈ columnÀ̳ª row¸¦ ´ëüÇÏ´Â ±â¼ú. ½Ã½ºÅÛ µ¿À۽à ¹ß»ýµÇ´Â ¿À·ù¸¦ ÀÚµ¿À¸·Î üũ ¹× ¼öÁ¤ÇÒ ¼ö ÀÖ´Â ±â´ÉÀ» ¸»Çϸç,MASK ROM ¹× DRAM Module Á¦À۽à »ç¿ëµÊ


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